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Continuous roll-to-roll exposure for FPC, BMS and metallic etching of roll materials — up to 200 m/h, 520×2000 mm web.
Values depend on model configuration
Full parameters of all 2 models
| Item | RTR535 | RTR412 |
|---|---|---|
| Platform type | Patterning-RTR | Patterning-RTR |
| Applications | FPC, BMS, Metallic etching (for roll material) | FPC, BMS, Metallic etching (for roll material) |
| Number of lenses | 5 | 4 |
| Wavelength | 405 nm | 405 nm |
| Max exposure area | 520×2000 mm | 250×800 mm |
| MP resolution | L/S = 50/50 μm | L/S = 25/25 μm |
| Outer layer alignment accuracy | ±12 μm | ±8 μm |
| Inner layer alignment accuracy | / | / |
| Throughput | 200 m/h @500×2000mm @50 mj/cm² | 75 m/h @250×800mm @50 mj/cm² |
| Line width tolerance | ±10% | ±10% |
| DOF | ±300 μm | ±100 μm |
| Scale mode | Fixed scale / Auto scale / Interval scale / Partition alignment | |
| File format | Gerber274x / ODB++ | |
| Equipment size | 6436×1895×2152 mm | 2500×1700×2150 mm |
| Equipment weight | 7.5 T | 4.5 T |
GIS Graphic Technology Co., Ltd.
+86 199 5132 0170 · +86 (0)512-66579218 · mk@gis-group.com.cn
